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zeige Details De Waard, H.., De Koning, W. L.. Modeling and control of diffusion and low-pressure chemical vapor deposition furnaces
In: Journal of Applied Physics. - [S.l.], ISSN 1089-7550, Vol. 67, No. 5 (1990), p. 2264-2271
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1990
In this paper a study is made of the heat transfer inside cylindrical resistance diffusion and low-pressure chemical vapor deposition furnaces, aimed at developing an improved temperature controller. A model of the thermal behavior is derived which also covers the important class of furnaces equipped with semitransparent quartz process tubes. The model takes into account the thermal behavior of the thermocouples. It is shown that currently used temperature controllers are highly inefficient for very large scale integration applications. Based on the model an alternative temperature controller of the linear-quadratic-Gaussian type is proposed which features direct wafer temperature control. Some simulation results are given.
beteiligte Personen: De Waard, H.. , De Koning, W. L..
Format: Elektronisch
Sprache: English
Erschienen: 1990.
Serie: AIP Digital Archive [Dig. Serial]
Schlagwörter:
URL: http://dx.doi.org/10.1063/1.345519

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