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zeige Details Choi, Young Chul., Shin, Young Min., ... Effect of surface morphology of Ni thin film on the growth of aligned carbon nanotubes by microwave plasma-enhanced chemical vapor deposition
In: Journal of Applied Physics. - [S.l.], ISSN 1089-7550, Vol. 88, No. 8 (2000), p. 4898-4903
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Aligned carbon nanotubes were synthesized on Ni-coated Si substrates using microwave plasma-enhanced chemical vapor deposition. The surface morphology of Ni thin films was varied with the rf power density during the rf magnetron sputtering process. It was found that the growth of carbon nanotubes was strongly influenced by the surface morphology of Ni thin film. Pure carbon nanotubes were synthesized on Ni thin film with uniformly distributed grain sizes, whereas large amounts of carbonaceous particles were produced in addition to the nanotubes, when the nanotubes were grown on Ni thin film with widely distributed grain sizes. With decreasing Ni-grain size, the diameter of nanotubes decreased and the length increased. High-resolution transmission electron microscope images clearly demonstrated the nanotubes to be multiwalled, and the graphitized structures were confirmed from the Raman spectra. Efficient field emission was observed from the diode structure with the nanotube tips. © 2000 American Institute of Physics.
beteiligte Personen: Choi, Young Chul. , Shin, Young Min. , Lim, Seong Chu. , Bae, Dong Jae. , Lee, Young Hee. , Lee, Byung Soo.
Format: Elektronisch
Sprache: English
Erschienen: 2000.
Serie: AIP Digital Archive [Dig. Serial]
Schlagwörter:
URL: http://dx.doi.org/10.1063/1.1314614

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